Which of the following films can be deposited by LPCVD or PECVD methods?
A、Single crystal Si films;
B、Polycrystalline Si films;
C、Amorphous dielectric films;
D、SiO2 films
发布时间：2025-08-10 03:16:46
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答案：Polycrystalline Si films ■Amorphous dielectric films ■SiO2 films
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